Electrochromism in oxyfluoride thin films

A. Azens, A. Gutarra, B. A. Stjerna, Claes G. Granqvist, J. Gabrusenoks, Andrejs R. Lusis

Research output: Chapter in Book/Report/Conference proceedingPaper (Conference contribution)

2 Scopus citations

Abstract

Oxyfluoride films based on W and Ti were prepared by reactive sputtering in plasmas containing O2 + CF4. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction, high coloration efficiency, and good cycling durability.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages435-442
Number of pages8
ISBN (Print)0819415642
StatePublished - 1 Dec 1994
EventOptical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII - Freiburg, Ger
Duration: 18 Apr 199422 Apr 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2255
ISSN (Print)0277-786X

Conference

ConferenceOptical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII
CityFreiburg, Ger
Period18/04/9422/04/94

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  • Cite this

    Azens, A., Gutarra, A., Stjerna, B. A., Granqvist, C. G., Gabrusenoks, J., & Lusis, A. R. (1994). Electrochromism in oxyfluoride thin films. In Proceedings of SPIE - The International Society for Optical Engineering (pp. 435-442). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2255). Society of Photo-Optical Instrumentation Engineers.